Qib Hluav Taws Xob Ethylene glycol monoethyl ether series (EE, DE) / CAS 110-80-5 / CAS 111-90-0

Kev Piav Qhia Luv:

Ethylene glycol monoethyl ether (EE); CAS 110-80-5

Diethylene glycol monoethyl ether (DE); CAS 111-90-0

Qib Hluav Taws Xob

Xa email rau peb

Cov Khoom Qhia Txog Khoom

Cov Cim Npe Khoom

Cov Khoom Siv Qhia Txog Khoom

Ethylene glycol monoethyl ether series (EE, DE)

Khoom	Ethylene glycol monoethyl ether (EE)	Diethylene glycol monoethyl ether (DE)
CAS	110-80-5	111-90-0
Cov mis molecular	C₂H₅THIAB₂CH₂OH	C₂H₅THIAB₂CH₂THIAB₂CH₂OH
Qhov tsos	Tsis muaj xim thiab kua ntshiab	Tsis muaj xim thiab kua ntshiab
Kev Huv Si (GC)% ≥	99.5	99.0
Kev sib xyaw ua ke (℃ / 760mmHg)	133.5-138.0	194.0-205.0
Dej noo (KF) % ≤	0.1	0.1
Acidity (raws li HAC) % ≤	0.005	/
Lub zog tshwj xeeb (d4)²⁰)	0.929 ± 0.005	0.989 ± 0.005
Xim (Pt-Co) ≤	15	15
Cov ntsiab lus ntawm cov hlau ion≤	10ppb (rau cov kev cai tshwj xeeb ≤1ppb)	10ppb (rau cov kev cai tshwj xeeb ≤1ppb)
Pob khoom thiab kev thauj mus los	190 lossis 194KGS / Nruas Cov tshuaj lom neeg txaus ntshai	200KGS/Nruas Cov tshuaj lom neeg txaus ntshai

Daim Ntawv Thov Khoom

Ethylene gycol monoethyl ether series, ib hom tshuaj yaj hauv kev lag luam hluav taws xob nrog kev ua tau zoo heev, yog siv dav hauv LCD photo-resist diluent hauv kev tsim cov LCD thiab optical resist, photo-resist remover, stripping agent, detergent rau IC, photo resist-removing buffer solution, corrosive processing thiab lwm yam tshuaj uas xav tau kev qhia tshwj xeeb; kuj siv dav ua cov tshuaj yaj rau kev tsim cov khoom siv hluav taws xob.

Yav dhau los: Ethylene glycol monomethyl ether series (EM, DEM, TEM) / CAS 109-86-4 / CAS 111-77-3 / CAS 112-35-6

Tom ntej no: Qib Hluav Taws Xob Ethylene glycol monobutyl ether series (EB, DEB) / CAS 111-76-2 / CAS 112-34-5

Diethylene glycol monoethyl ether (DE)