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Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6 Mufananidzo Unoratidzwa
  • Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6
  • Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6
  • Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6
  • Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6

Ethylene glycol monomethyl ether series (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6

Tsananguro pfupi:

Ethylene glycol monomethyl ether (EM)/ 2-Methoxyethanol; CAS 109-86-4

Di-ethylene glycol monomethyl ether (DEM)/ 2-(2-Methoxyethoxy)ethanol; CAS 111-77-3

Triethylene glycol monomethyl ether (TEM); CAS 112-35-6

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Tsanangudzo yeChigadzirwa

Ethylene glycol monomethyl ether series (EM, DEM, TEM)
Chinhu Ethylene glycol monomethyl ether (EM) Diethylene glycol monomethyl ether (DEM) Triethylene glycol monomethyl ether (TEM)
CAS 109-86-4 111-77-3 112-35-6
Fomura yemamorekuru CH3UYE2CH2OH CH3UYE2CH2UYE2CH2OH CH3O(C)2H4THE)3H
Chitarisiko Mvura isina ruvara uye yakajeka Mvura isina ruvara uye yakajeka Mvura isina ruvara uye yakajeka
Kuchena (GC)% ≥ 99.5 99.0 98.0
Kunyungudutsa kwemhando yepamusoro (℃/760mmHg) 122.5-127.0 191.0-198.0 230.0-250.0
Hunyoro (KF) % ≤ 0.1 0.1 0.1
Acidity 0.01 / /
Simba regiravhiti (d4)20) 0.965±0.005 1.018±0.005 1.049±0.005
Ruvara (Pt-Co) ≤ 10 15 30
Zviri mukati me ion yesimbi ≤ 10ppb (yezvinodiwa zvakakosha ≤1ppb) 10ppb (yezvinodiwa zvakakosha ≤1ppb) 10ppb (yezvinodiwa zvakakosha ≤1ppb)
Pakeji uye kutakurwa 190 kana 200KGS/Drum Kemikari ine njodzi 200KGS/Drum Kemikari Yakajairika 200KGS/Drum Kemikari Yakajairika

Kushandiswa Kwechigadzirwa

Ethylene glycol monomethyl ether nhevedzano, rudzi rwechinhu chinonyungudutsa chemagetsi chinoshanda zvakanaka, chinoshandiswa zvakanyanya semusanganiswa weLCD unodzivirira kupenya kwemifananidzo mukugadzira LCD uye optical resist, photo-resist remover, stripping agent, sipo yeIC, photo resist-removing buffer solution, corrosive processing nemamwe makemikari anoda hunyanzvi hwakakosha; chinoshandiswawo zvakanyanya se solvent pakugadzira zvinhu zvemagetsi.

Inoshandiswa sechinhu chinonyungudutsa, chinotetepa, chinodzivirira kutonhora mumabasa akadai se inki yekudhinda, chinoshandiswa muindasitiri, pendi, dhayi, ndiro yesimbi yemhangura, electrolytc capacitor uye mafuta ekufambisa ndege, inoshandiswa sezvinhu zvisina kugadzirwa mukubatsira machira, mvura yemhando yepamusoro, chinoshandiswa mukuchenesa mvura inonyungudika, dhayi yemvura yakagadzirwa uye chinhu chinobvisa sulphur mukuchenesa mafuta, nezvimwewo.

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