Qib Kev Lag Luam / Hluav Taws Xob TMAH 25% Tetramethylammonium Hydroxide cas 75-59-2 Duab Tshwj Xeeb

Kev Lag Luam / Hluav Taws Xob Qib TMAH 25% Tetramethylammonium Hydroxide cas 75-59-2

Kev Piav Qhia Luv:

Lub Npe Tshuaj: Tetramethylammonium Hydroxide (TMAH)

Hom: 25% TMAH (kua); 99% TMAH (hmoov)

CAS 75-59-2

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Cov Khoom Qhia Txog Khoom

Cov Cim Npe Khoom

Kev piav qhia txog khoom

TMAH 25% Tetramethylammonium Hydroxide cas 75-59-2

Cov ntsiab lus khoom:

Lub Npe Khoom: TMAH 25%; Tetramethylammonium Hydroxide

CAS Naj Npawb: 75-59-2

Cov mis mos molecular: C4H13NO

Tsos: kua tsis muaj xim

Nws thawj yog ib qho siv lead ua xim tsis muaj xim (muaj peb/tsib dej siv lead ua), yooj yim nqus dej noo, nrog qee qhov tsw ntawm ammonia thiab muaj zog basicity; nqus cov pa roj carbon dioxide hauv huab cua, tsim cov carbonate, organic alkali, nrog rau corrosivity muaj zog. Cov khoom muaj ob hom kev qhia: dej kua thiab methanol kua.

Cov yam ntxwv

Tetramethylammonium hydroxide (TMAH lossis TMAOH) yog ntsev quaternary ammonium nrog cov mis molecular [(CH3)4N] + [OH] -, thiab yog tus tswv cuab yooj yim tshaj plaws ntawm cov chav kawm ntawm cov organic quaternary ammonium compounds. Ib qho ntawm nws cov kev siv hauv kev lag luam yog rau kev anisotropic etching ntawm silicon. Nws kuj tseem siv ua cov kuab tshuaj yooj yim hauv kev tsim cov acidic photoresist hauv cov txheej txheem photolithography. Vim tias nws yog cov catalyst hloov pauv theem, nws muaj txiaj ntsig zoo hauv kev tshem tawm photoresist. Nws kuj tseem siv ua surfactant hauv kev tsim cov ferrofluid, los tiv thaiv kev sib sau ua ke.

Daim Ntawv Thov

1) Hauv qhov kev tshuaj xyuas, tetramethylammonium Hydroxide tuaj yeem siv ua cov tshuaj polarographic.

2) Hais txog kev ntxuav cov khoom, nws tau siv los ua cov tshauv dawb alkali kom txo qee cov khoom siv hlau.

3) hauv kev lag luam hluav taws xob, tshwj xeeb tshaj yog ua tus tsim tawm resister zoo, silicon wafer ntub etchant thiab super huv kev daws teeb meem rau CMP txheej txheem.

4) hauv kev tsim cov integrated circuits, cov kua siv lead ua kua, cov ntawv luam tawm circuit boards, capacitors, sensors, thiab ntau lwm yam khoom siv hluav taws xob.

Cov ntaub ntawv xa khoom

Cov Ntaub Ntawv Txog Kev Xa Khoom	Cov thawv
	200L nruas huv si
	Lwm cov thawv muaj thaum thov.
	Kev faib tawm ntawm kev xa khoom
	Lub npe xa khoom kom raug: tetramethylammonium hydroxide
	Kev faib tawm ntawm kev phom sij: 8
	Tus lej ID: UN1835, PGII

Kev Nyab Xeeb thiab Kev Tswj Xyuas	Yog xav paub ntxiv txog kev nyab xeeb thiab kev tuav pov hwm, thov mus saib
	Daim Ntawv Qhia Txog Kev Nyab Xeeb Khoom Siv uas muaj thaum thov.

Cov Lus Qhia Tshwj Xeeb

Khoom	Cov Ntawv Qhia
Qhov tsos	kua tsis muaj xim
Kev Ntsuas	25.00 ± 0.50%
Hazen	≤ 50 #
(CO32-)	≤ 40ppm
(Cl)	≤ 0.1ppm
(CH3OH)	≤ 40ppm
(Qhov ntawd)	≤ 5ppb
(Qhov ntawd)	≤ 10ppb
(Mg)	≤ 5ppb
(Al)	≤ 10ppb
(K)	≤ 10ppb
(Qhov ntawd)	≤ 10ppb
(Cr)	≤ 5ppb
(Mn)	≤ 5ppb
(Fe)	≤ 5ppb
(Co)	≤ 5ppb
(Hauv)	≤ 5ppb
(Nrog)	≤ 5ppb
(Zn)	≤ 5ppb
(Rau)	≤ 5ppb
(Ntawm)	≤ 5ppb
(Cd)	≤ 5ppb
(Pb)	≤ 5ppb
me me (≥0.5μm)	≤100ea/ml