Ọkwa ụlọ ọrụ/elektrọnik TMAH 25% Tetramethylammonium Hydroxide cas 75-59-2
TMAH 25% Tetramethylammonium Hydroxide cas 75-59-2
Nkọwa ngwaahịa:
Aha Ngwaahịa: TMAH 25% ; Tetramethylammonium Hydroxide
Nọmba CAS: 75-59-2
Usoro Molekụla: C4H13NO
Ọdịdị: mmiri mmiri enweghị agba
Ọ bụ kristal mbụ ya dị ka kristal na-enweghị agba (nwere mmiri kristal atọ/ise), dị mfe ịmịkọrọ mmiri, nwere isi ammonia na isi ike siri ike; na-amịkọrọ carbon dioxide n'ikuku, na-emepụta carbonate, organic alkali, yana corrosivity siri ike. Ngwaahịa a nwere ụdị nkọwapụta abụọ: ngwọta mmiri na ngwọta methanol.
Tetramethylammonium hydroxide (TMAH ma ọ bụ TMAOH) bụ nnu ammonium nke nwere usoro molekul [(CH3)4N]+[OH]-, ọ bụkwa ihe kachasị mfe na klas nke organic quaternary ammonium compounds. Otu n'ime ojiji ya n'ụlọ ọrụ mmepụta ihe bụ maka anisotropic etching nke silicon. A na-ejikwa ya dị ka ihe mgbaze bụ isi na mmepe nke acidic photoresist na usoro photolithography. Ebe ọ bụ na ọ bụ ihe na-akpali mgbanwe nkebi, ọ dị irè nke ukwuu n'iwepụ photoresist. A na-ejikwa ya dị ka surfactant na mmepụta nke ferrofluid, iji gbochie agglomeration.
1) N'akụkụ nyocha, enwere ike iji tetramethylammonium Hydroxide dị ka ihe na-eme ka ihe dị na polagraphic.
2) Maka nhicha ngwaahịa, e jiri ya dị ka alkali na-enweghị ntụ iji mebie ụfọdụ ihe ígwè.
3) na ụlọ ọrụ eletrọniki, ọkachasị dịka onye nrụpụta resister dị mma, silicon wafer wet etchant na ngwọta dị ọcha nke ukwuu maka usoro CMP.
4) n'imepụta sekit agbakọtara ọnụ, ihe ngosi kristal mmiri mmiri, bọọdụ sekit ebipụtara, capacitors, sensọ, na ọtụtụ ihe eletrọniki ndị ọzọ.
| Ozi Mbupu | Akpa |
| 200L drum dị ọcha | |
| A na-enweta akpa ndị ọzọ ma ọ bụrụ na achọrọ ya. | |
| Nhazi Mbupu | |
| Aha mbupu kwesịrị ekwesị: tetramethylammonium hydroxide | |
| Nkewa ihe egwu: 8 | |
| Nọmba njirimara: UN1835, PGII |
| Nchekwa na Njikwa | Maka ozi nchekwa na njikwa kpọmkwem, biko gaa na |
| Mpempe akwụkwọ nchekwa ihe nke dị ma ọ bụrụ na achọrọ ya. |
| ihe | Ndepụta Ndekọ |
| Ọdịdị | Mmiri mmiri na-enweghị agba |
| Nnwale | 25.00±0.50% |
| Hazen | ≤ 50# |
| (CO32-) | ≤ 40ppm |
| (Cl) | ≤ 0.1ppm |
| (CH3OH) | ≤ 40ppm |
| (Nke ahụ) | ≤ 5ppb |
| (Nke ahụ) | ≤ 10ppb |
| (Mg) | ≤ 5ppb |
| (Al) | ≤ 10ppb |
| (K) | ≤ 10ppb |
| (Nke ahụ) | ≤ 10ppb |
| (Cr) | ≤ 5ppb |
| (Mn) | ≤ 5ppb |
| (Fe) | ≤ 5ppb |
| (Co) | ≤ 5ppb |
| (N'ime) | ≤ 5ppb |
| (Na) | ≤ 5ppb |
| (Zn) | ≤ 5ppb |
| (Maka) | ≤ 5ppb |
| (Na) | ≤ 5ppb |
| (Cd) | ≤ 5ppb |
| (Pb) | ≤ 5ppb |
| ihe dị obere (≥0.5μm) | ≤100ea/ml |
200kg ma ọ bụ 25kg/gbamgbam
a, Echekwara ya n'ebe dị jụụ, kpọrọ nkụ, na ebe ikuku na-abata
b, Wepụ ọkụ na okpomọkụ
c, Jikwaa ya nke ọma, ọ dịghịkwa emebi emebi
